Tungsten Round Sputtering Target
Tungsten Round Sputtering Target Description & Daim ntawv thov
Lub hom phiaj yog ib qho ntawm cov khoom siv tsis tseem ceeb rau magnetron sputtering technology, thiab qhov kev ua tau zoo ntawm lub hom phiaj ntau dua los yog tsawg dua txiav txim siab qhov kev ua tau zoo thiab qhov zoo ntawm cov yeeb yaj kiab tso. Tungsten Round Sputtering Target muaj qhov siab tshaj plaws melting point ntawm tag nrho cov hlau ntsiab lus, thiab muaj qhov zoo ntawm high density, siab purity, uniform internal qauv, zoo kub stability, muaj zog tsis kam mus rau electron tsiv teb tsaws, muaj zog corrosion kuj thiab ntev kev pab cuam lub neej. Tungsten Round Sputtering Target feem ntau yog tsim los ntawm lub tshuab nqus tsev melting thiab kub nias, ua raws li dov, txiav thiab annealing. Nws yog feem ntau siv hauv kev lag luam hluav taws xob thiab kev lag luam hnub ci zog. Tungsten Round Sputtering Targets uas tsim los ntawm peb lub tuam txhab kuj tuaj yeem siv rau hauv plasma sputtering, aerospace, petrochemical, semiconductor iav txheej, kev tsim kho thiab kho qhov muag cov ntaub ntawv chaw lag luam.
Tungsten Round Sputtering TargetSpecifications:
Khoom siv | Tungsten |
Purity | 99.99-99.999 feem pua |
Loj | Φ1mm -300 hli |
Thickness | 10mm -450 hli |
Qhov ntom | 19.35g / cm33 |
Melting Point | 3410 degree |
Nto | Milling, Sib Tsoo, Dub, Ci Polished |
Lub sij hawm xa tuaj | 15-20 hnub |
Txuj | ASTM B760-86, GB 3875-83, ANSI |
Daim ntawv pov thawj | ISO9001 |
Tungsten Round Sputtering Target Duab:


Cim npe nrov: tungsten round sputtering phiaj, lwm tus neeg, manufacturers, hoobkas, customized, lag luam wholesale, nqe, hais, kev muag khoom
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