Magnetron sputtering txheej yog ib hom tshiab ntawm lub cev vapor txheej txheej txheem, uas siv lub tshuab phom electron kom emit thiab tsom electrons ntawm cov khoom yuav tsum tau coated, kom cov sputtered atoms ua raws li lub hauv paus ntsiab lus ntawm lub zog hloov dua siab tshiab, kom cov khoom muaj ntau dua mechanical. khoom. Cov khoom yuav tsum tau plated yog hu ua lub hom phiaj sputtering, uas feem ntau suav nrog cov hlau, alloys thiab ceramic compounds.FANMETAL tuaj yeem muab cov neeg siv khoom zoo rau cov hom phiaj hlau zoo xws liNtshiab Chromium Sputtering Target, Kub Sputtering Target,Titanium Aluminium Sputtering Targetthiab Copper Sputtering Target. Thov xa email tuaj rau peb qhia koj cov kev xav tau.
1. Kev ntshiab
Purity yog ib qho tseem ceeb ntawm kev ua tau zoo ntawm lub hom phiaj, vim hais tias qhov purity ntawm lub hom phiaj muaj kev cuam tshuam zoo rau kev ua yeeb yam ntawm cov yeeb yaj kiab. Txawm li cas los xij, hauv kev siv tswv yim, cov kev cai purity ntawm lub hom phiaj kuj txawv. Piv txwv li, nrog kev loj hlob sai ntawm kev lag luam microelectronics, qhov loj ntawm silicon wafers tau loj hlob los ntawm 6 ", 8" mus rau 12", thiab qhov dav ntawm txoj hlua tau raug txo los ntawm 0.5um rau 0 .25um, 0.18um lossis txawm tias 0.13um. Lub hom phiaj yav dhau los purity yog 99.995 feem pua Nws tuaj yeem ua tau raws li cov txheej txheem yuav tsum tau ua ntawm 0.35um IC, thaum qhov kev npaj ntawm {{15 }}.18um kab yuav tsum 99.999 feem pua lossis txawm tias 99.9999 feem pua ntawm cov hom phiaj purity.
2. Cov ntsiab lus impurity
Cov impurities nyob rau hauv lub hom phiaj khoom thiab oxygen thiab noo noo nyob rau hauv lub pores yog lub ntsiab pa phem qhov chaw ntawm deposited zaj duab xis. Cov khoom siv rau lub hom phiaj sib txawv muaj cov kev cai sib txawv rau cov ntsiab lus impurity sib txawv. Piv txwv li, ntshiab aluminium thiab aluminium alloy lub hom phiaj siv nyob rau hauv kev lag luam semiconductor muaj cov cai tshwj xeeb rau cov ntsiab lus ntawm alkali hlau thiab cov ntsiab lus ntawm cov khoom siv hluav taws xob.
3. Ceev ceev
Txhawm rau txo cov pores hauv lub hom phiaj khoom thiab txhim kho kev ua haujlwm ntawm cov yeeb yaj kiab sputtered, lub hom phiaj feem ntau yuav tsum muaj qhov ntom ntom dua. Qhov ceev ntawm lub hom phiaj cuam tshuam tsis yog tsuas yog tus nqi sputtering xwb, tab sis kuj yog cov khoom siv hluav taws xob thiab kho qhov muag ntawm cov yeeb yaj kiab. Qhov siab dua lub hom phiaj ntom, qhov ua tau zoo ntawm cov yeeb yaj kiab. Tsis tas li ntawd, nce qhov ceev thiab lub zog ntawm lub hom phiaj ua rau lub hom phiaj zoo tuaj yeem tiv taus cov thermal stress thaum lub sij hawm sputtering. Qhov ntom kuj yog ib qho ntawm cov cim qhia ua haujlwm tseem ceeb ntawm lub hom phiaj.
4. Cov nplej loj thiab cov nplej loj faib
Feem ntau cov hom phiaj yog cov qauv polycrystalline, thiab cov nplej loj tuaj yeem nyob ntawm microns mus txog millimeters. Rau cov khoom siv tib lub hom phiaj, qhov sputtering tus nqi ntawm lub hom phiaj nrog cov nplej zoo yog sai dua li ntawm lub hom phiaj nrog coarse nplej; thiab thickness tis ntawm cov zaj duab xis tso los ntawm sputtering nrog ib tug me me grain loj sib txawv (uniform faib) yog ntau uniform.
