Copper Sputtering Target
Copper Sputtering Target Description & Daim ntawv thov
Sputtering lub hom phiaj yog ib chav kawm tshwj xeeb ntawm cov ntaub ntawv uas feem ntau yog siv rau hauv cov txheej txheem nyias txheej thiab lub tshuab nqus tsev txheej kev lag luam. Copper Sputtering Target yog ib yam khoom ntawm high-purity tooj liab hlau ua tiav los ntawm ntau cov txheej txheem (xws li extrusion, kos duab, kho cua sov thiab machining, thiab lwm yam), thiab muaj ntau yam zoo heev, xws li siab purity, tsis tshua muaj nqi, hluav taws xob thiab thermal conductivity Muaj zog, ua haujlwm siab ntau lawm thiab ua haujlwm ntev. Copper Sputtering Target tuaj yeem muab faib ua lub hom phiaj tooj liab (piv txwv li lossis square) thiab rotating tooj liab sputtering lub hom phiaj (feem ntau tubular), thiab tus qauv loj yog txiav txim siab raws li daim ntawv thov tiag tiag lossis cov neeg siv khoom xav tau. Copper Sputtering Targets yog cov khoom siv sputtering nyiam, haum rau DC bipolar sputtering, tripolar sputtering, quadrupole sputtering, ion beam sputtering lossis magnetron sputtering, thiab lwm yam, thiab tuaj yeem siv rau cov tsho tiv thaiv zaj duab xis, conductive films, semiconductor films, zoo nkauj films, integrated. circuits thiab displays, thiab lwm yam.
Copper Sputtering TargetSpecifications:
Khoom siv | Tooj |
Purity | 99.95% ua |
Loj | Φ60 x 16 mm |
Qhov ntom | 8.9 g / cm33 |
Melting Point | 1083 degree |
Nto | Polished, Rolled, Cleaned, Machined, Av, Alkali Ntxuav |
Lub sij hawm xa tuaj | 15-20 hnub |
Txuj | ASTM, GB, ANSI |
Daim ntawv pov thawj | ISO9001 |
Copper Sputtering Target Duab:


Cim npe nrov: tooj liab sputtering phiaj, lwm tus neeg, manufacturers, hoobkas, customized, lag luam wholesale, nqe, hais, kev muag khoom
Xa kev nug


