Titanium Aluminium Sputtering Target

Titanium Aluminium Sputtering Target Description

Lub hom phiaj sputtering yog hais txog cov khoom siv raw siv hauv cov txheej txheem sputtering deposition, uas yog hais txog cov txheej txheem ntawm ejecting atoms los ntawm lub hom phiaj ntawm lub hom phiaj vim lub bombardment ntawm lub hom phiaj los ntawm high-zog hais, thiab nws lub luag haujlwm tseem ceeb yog tso ib zaj duab xis nyias. ntawm qhov khoom. Titanium Aluminium Sputtering Target yog lub hom phiaj siv ntau heev, uas tuaj yeem tsim los ntawm txoj kev casting thiab kub isostatic nias txoj kev. Cov txheej txheem tshwj xeeb yog: ua ntej yaj cov khoom siv hlau, tom qab ntawd ncuav nws mus rau hauv pwm los ua ib qho ingot, thiab tom qab ntawd forge nws, Rolled, sintered thiab polished. Titanium Aluminium Sputtering Targets feem ntau yog siv rau cov khoom siv kho kom zoo nkauj, uas tuaj yeem tso cov yeeb yaj kiab nrog cov tawv tawv zoo, siab ci, corrosion tsis kam, oxidation tsis kam, thiab zoo fading kuj. Yog tias koj xav tau, peb tuaj yeem muab Titanium Aluminium Sputtering Targets ua ke nrog tooj liab substrate phaj, koj tuaj yeem tiv tauj peb los ntawm email.

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